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苏州晶拓半导体科技有限公司

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国产高浓度,大流量,无氮添加臭氧系统!
Application:
● TEOS-O3 Process CVD;
● ALD for High-K dielectric deposition;
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产品详情

● Ultra clean for Semiconductor process;  

● High Ozone Concentration up to 400g/m3;

● High Flow up to 94 slm @ 210g/m3;

● Long lifetime discharging Cell;

● Ozone gas analyzer intergrated;

● Gas control system inside;

● Close loop Ozone concentration controlling system;

● SEMI-S2 and CE Certification;


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